Wu, BingSun, YunyunTan, HenryWu, Shijing2024-12-182024-12-182024-12Wu, B, Sun, Y, Tan, H & Wu, S 2024, 'Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive', Materials Today Communications, vol. 41, 110744. https://doi.org/10.1016/j.mtcomm.2024.1107442352-4928ORCID: /0000-0003-4894-8098/work/174357676https://hdl.handle.net/2164/2478410980045engMolecular dynamicsNano-polishingRough topographySilicon carbideTA Engineering (General). Civil engineering (General)General Materials ScienceMechanics of MaterialsMaterials ChemistryTAMolecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasiveJournal article10.1016/j.mtcomm.2024.110744http://www.scopus.com/inward/record.url?scp=85207086168&partnerID=8YFLogxK41