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Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive

dc.contributor.authorWu, Bing
dc.contributor.authorSun, Yunyun
dc.contributor.authorTan, Henry
dc.contributor.authorWu, Shijing
dc.contributor.institutionUniversity of Aberdeen.Engineeringen
dc.date.accessioned2024-12-18T10:02:01Z
dc.date.available2024-12-18T10:02:01Z
dc.date.issued2024-12
dc.description.statusPeer revieweden
dc.format.extent10
dc.format.extent980045
dc.identifier298472266
dc.identifier75442da3-1fd4-4e0c-a0f0-67bf3a373b32
dc.identifier85207086168
dc.identifier.citationWu, B, Sun, Y, Tan, H & Wu, S 2024, 'Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive', Materials Today Communications, vol. 41, 110744. https://doi.org/10.1016/j.mtcomm.2024.110744en
dc.identifier.doi10.1016/j.mtcomm.2024.110744
dc.identifier.issn2352-4928
dc.identifier.otherORCID: /0000-0003-4894-8098/work/174357676
dc.identifier.urihttps://hdl.handle.net/2164/24784
dc.identifier.urlhttp://www.scopus.com/inward/record.url?scp=85207086168&partnerID=8YFLogxKen
dc.identifier.vol41en
dc.language.isoeng
dc.relation.ispartofMaterials Today Communicationsen
dc.subjectMolecular dynamicsen
dc.subjectNano-polishingen
dc.subjectRough topographyen
dc.subjectSilicon carbideen
dc.subjectTA Engineering (General). Civil engineering (General)en
dc.subjectGeneral Materials Scienceen
dc.subjectMechanics of Materialsen
dc.subjectMaterials Chemistryen
dc.subject.lccTAen
dc.titleMolecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasiveen
dc.typeJournal articleen

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